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參數(shù)資料
| 型號： | C7460 |
| 廠商： | Hamamatsu Photonics |
| 英文描述： | Multiband Plasma-Process Monitor |
| 中文描述： | 多波段等離子體進程監(jiān)視器 |
| 文件頁數(shù)： | 6/8頁 |
| 文件大?。?/td> | 524K |
| 代理商： | C7460 |
An example of an end-point detection of oxidization film
etching (1% or less of aperture ratio) is shown in Fig. 1.
Although it was difficult to detect the end-point of a process
from the time changes in spectrum intensity by using the
conventional method, detection with sufficient accuracy is
possible with the U8851.
Fig. 1 Comparison of U8851 with conventional method
Conventional method
U8851
End point
S
1
(
λ
)
T
1
(t)
S
2
(
λ
)
S
3
(
λ
)
T
2
(t)
T
3
(t)
G
Measurement data D (
λ
,t)
D (l, t) = Average spectrum + S
1
(l)
×
T
1
(t) + S
2
(l)
×
T
2
(t) + S
3
(l)
×
T
3
(t)
Fig. 2 Analysis pattern
End-point Synthesis Tool U8851
Optional Software
The U8851 is an optional software application that is utilized
with the Multiband Plasma-Process Monitor C7460 for end-
point detection in plasma etching.
With the U8851, highly sensitive end-point detection of the
conventionally difficult small aperture process has been
made possible.
In addition, since the process data of several wafers can be
analyzed simultaneously, the reliability of the operation
formula that performs an end-point detection is improved,
the verification of an end-point detection is performed easily,
and the stability evaluation of a process can be performed as
well.
G
End-point detection in small aperture process
G
Simultaneous analysis of several wafers
G
Stability evaluation of a process
FEATURES
OUTLINE
COMPARISON
OPERATIONAL OUTLINE
6
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