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參數資料
| 型號： | C7460 |
| 廠商： | Hamamatsu Photonics |
| 英文描述： | Multiband Plasma-Process Monitor |
| 中文描述： | 多波段等離子體進程監(jiān)視器 |
| 文件頁數： | 3/8頁 |
| 文件大?。?/td> | 524K |
| 代理商： | C7460 |
BENEFITS (EXAMPLES)
G
Easy Plasma Status Settings
Real-time monitoring of the plasma process supports easy to
make settings for the volume of introduced gas and plasma power.
Product yield is increased through improved processing stability,
and the early discovery of abnormalities.
G
Advanced Endpoint Detection
Powerful scripts can be defined as recipes for each endpoint
detection. It is possible to use the information in the whole
spectrum by means of the unique spectral patterns method.
This allows for advanced endpoint control with unprecedented
specificity and precision.
G
Higher Efficiency through Automatic Cleaning Control
Particularly with CVD, in which the chamber must be cleaned
each time a wafer is processed, cleaning time has a major effect
on actual operating efficiency. The automatic control features
greatly improved throughput, increased productivity, and reduced
costs.
G
Monitoring of Impurities and Abnormal Discharges
Monitoring of the emission band, which does not occur in normal
processes, provides warning of impurities and abnormal dis-
charges before they occur, and thus improves yield.
L
3-d display of plasma emission of CVD Cleaning (CF
4
, O
2
, Ar) of SiN
PLASMA CVD
CLEANING
from 200 nm to 950nm
Simultaneous Measurement
3
SYSTEM STRUCTURE
Driver Software
U9046
Plasma Process
Data Acquisition Software
Network
Plasma equipment
U8851
End-point Synthesis Tool
Database
spectrum data
with process data
control
process data
Plasma
Emission
EPD signal
control
spectrum
data
formula for
end-point detection
Optional
Standard
MPM(C7460)
(Hardware)
APPLICATIONS OVERVIEW
Due to the high versatility of the hardware and the soft-
ware framework, the MPM is suitable for various different
applications, without any compromise in performance or
convenience. These applications can be grouped into the
following categories:
G
Engineering Tasks
Such as process optimization, comparison and matching;
trouble-shooting; etc.
G
Endpoint Control
Advanced, highly specific and sensitive end point control.
G
Fault Detection
Highly selective automatic fault detection.
G
APC Sensor
Automatic extraction of highly specific APC key numbers.
(Under development)
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相關代理商/技術參數 |
參數描述 |
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| C7470RJR | 功能描述:線繞電阻器 - 透孔 C7 470R 5% REELED RoHS:否 制造商:Bourns 電阻:10 Ohms 容差:5 % 功率額定值:7 W 溫度系數:200 PPM / C 系列:FW 端接類型:Axial 工作溫度范圍:- 55 C to + 155 C 尺寸:9.5 mm Dia. x 26 mm L 封裝:Ammo 產品:Power Resistors Wirewound High Energy |
| C7470RJT | 功能描述:線繞電阻器 - 透孔 RoHS:否 制造商:Bourns 電阻:10 Ohms 容差:5 % 功率額定值:7 W 溫度系數:200 PPM / C 系列:FW 端接類型:Axial 工作溫度范圍:- 55 C to + 155 C 尺寸:9.5 mm Dia. x 26 mm L 封裝:Ammo 產品:Power Resistors Wirewound High Energy |
| C7473-36 | 制造商:HAMAMATSU 制造商全稱:Hamamatsu Corporation 功能描述:Photonic Multichannel Spectral Analyzer Model: PMA-11 |
| C74757-000 | 制造商:TE Connectivity 功能描述:C74757-000 制造商:TE Connectivity 功能描述:202G632-780-0 - Bulk |
| C747-7/8B | 制造商:Thomas & Betts 功能描述:ADJ. BEAM ATTACHMENT |
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